Frascati Research Centre, Technical Unit APRAD, P.O. Box 65, 00044 Frascati, Rome, Italy)

These evil scientists are working on this technology and they also have UN backing to do so! This is INSIDIOUS! This is DEMONIC!

The other players are out of California with LUCENT TECHNOLOGIES (another Luciferian Satanic Company) involved as well. I found articles online and they are plugging this with the camera (CANON)  & Telephone companies (ATT) as well, because of the high-resolution  obtained and the downsizing of phones, laptops, I-pads, etc. that the public loves to own.  Smaller, better, lighter, flashier, etc.

Well they are spying on you now on a microscopic level! The whole Verizon cell phone HOAX is a JOKE compared to what’s really going on. You’ve got the chips INSIDE of you that are doing the spying. They know everything about you. No computer necessary now. That’s how they can target the ELECT also so well. 

The chip itself uses MIRRORS. This is MIRROR MAGIC on a microscopic scale. Five to be exact, so you can see where the PENTAGRAM comes into play. Regular Lithography only used one mirror.  They are also using different UV wavelengths.

YaHuWaH knows exactly what they are up to. He alone can change scientific properties if he chooses. They are trying to play god with established scientific laws and principles. Well, There is only one Creator  GOD,and His name is

YaHuWaH!!

Here is a clip from a paper from University at Berkley:The Mask-Making Challenge

Industry experts generally agree that the biggest challenges and risks for the next generation of lithography systems involve the mask-that is, the master pattern used to “print” the semiconductor circuits onto the silicon wafers or chips. The technology that successfully overcomes the hurdles of mask production has a good chance of becoming the preferred choice.
In EUVL,  (EVIL) a mask is produced by applying multilayers of molybdenum and silicon to a flat substrate. The circuit pattern is produced by applying a final EUV-absorbing metal layer and then etching away the metal to form the image of the circuit.
One key requirement is to produce a mask with essentially no defects. Any small defect ends up being replicated, or printed, in the lithography process onto the computer chips being manufactured, thus damaging the chips’ complex circuitry. A key breakthrough in this area was the development of an Ultra Clean Ion Beam Sputter Deposition System about two years ago. This system-also an R&D 100 Award winner-produces precise, uniform, highly reflective masks with fewer defects than those produced by conventional physical deposition processes.(See S&TR, October 1997, p. 8.)

So here we have reference to THE MASK once again as in Jim Carrey’s Hollywood movie THE MASK and an acronym in EVUL for EVIL. The EVIL MASK.. GET IT??

Wake up people. YOU are being Controlled …

And these scientists are NOT HUMAN.